Processing and characterisation

We have a range of pre and post processing equipment for treatment of semiconductor devices both before and after implantation.

Facilities

  • Rapid thermal processing
  • Tube furnace annealers
  • Photolithography
  • Capping layer deposition and removal
  • Chemical vapour deposition
  • Oxidation
  • Dual beam focused ion beam.

The Centre also has a number of electrical and optical characterisation facilities including:

  • Differential hall effect
  • CV-IV
  • 4 point probe mapping
  • Photo and electro luminescence
  • Thermawave
  • Elipsometry
  • Optical and electron microscopy
  • Ion beam analysis - RBS, PIXE, NRA, ERD, etc.

Contact us

Find us

Address
Ion Beam Centre
Advanced Technology Institute
University of Surrey
Guildford
Surrey
GU2 7XH