Processing and characterisation
We have a range of pre and post processing equipment for treatment of semiconductor devices both before and after implantation.
Facilities
- Rapid thermal processing
- Tube furnace annealers
- Photolithography
- Capping layer deposition and removal
- Chemical vapour deposition
- Oxidation
- Dual beam focused ion beam.
The Centre also has a number of electrical and optical characterisation facilities including:
- Differential hall effect
- CV-IV
- 4 point probe mapping
- Photo and electro luminescence
- Thermawave
- Elipsometry
- Optical and electron microscopy
- Ion beam analysis - RBS, PIXE, NRA, ERD, etc.