Processing and characterisation

The Ion Beam Centre has a range of pre and post processing equipment for treatment of semiconductor devices both before and after implantation.

Facilities include:

  • Rapid Thermal Processing
  • Tube Furnace Annealers
  • Photolithography
  • Capping Layer Deposition and Removal
  • Chemical Vapour Deposition
  • Oxidation
  • Dual Beam Focused Ion Beam

The Centre also has a number of electrical and optical characterisation facilities including:

  • Differential Hall Effect
  • CV-IV
  • 4 point probe mapping
  • Photo and Electro Luminescence
  • Thermawave
  • Elipsometry
  • Optical and electron microscopy
  • Ion Beam Analysis - RBS, PIXE, NRA, ERD, etc

Contact us

Find us

Ion Beam Centre
Advanced Technology Institute
University of Surrey