Processing and characterisation
The Ion Beam Centre has a range of pre and post processing equipment for treatment of semiconductor devices both before and after implantation.
- Rapid Thermal Processing
- Tube Furnace Annealers
- Capping Layer Deposition and Removal
- Chemical Vapour Deposition
- Dual Beam Focussed Ion Beam
The Centre also has a number of electrical and optical characterisation facilities including:
- Differential Hall Effect
- 4 point probe mapping
- Photo and Electro Luminescence
- Optical and electron microscopy
- Ion Beam Analysis - RBS, PIXE, NRA, ERD, etc.