Localised planar patterns in a singularly perturbed Reaction Diffusion system
In this project we will investigate 2D patterns in a reaction-diffusion system modelled by partial differential equations near the limit where the diffusion of one variable goes to zero, that leads to planar patterns with sharp transitions.
Start date1 October 2022
DurationMinimum of 3 years
Funding sourceUniversity of Surrey
Full UK tuition fees and a tax-free stipend. This project is on offer in competition with a number of other projects for funding. This opportunity may be available with partial funding for overseas fees for exceptional applicants. However, funding for overseas students is limited and applicants are encouraged to find suitable funding themselves.
Planar patterns that involve sharp spatial transitions occur in a wide range of applications from vegetation to chemical reaction networks. In this project we will investigate 2D patterns in a reaction-diffusion system modelled by partial differential equations near the limit where the diffusion of one variable goes to zero, that leads to planar patterns with sharp transitions. This project would be perfect for a candidate that enjoys a mixture of nonlinear dynamical systems analysis, partial differential equations, and numerical methods.
The successful candidate will receive comprehensive research training related to all aspects of the research and opportunities to participate in conferences, workshops and seminars to develop professional skills and research network.
Applicants should have a minimum of a first class honours degree in mathematics, the physical sciences or engineering. Preferably applicants will hold a MMath, MPhys or MSc degree, though exceptional BSc students will be considered
English language requirements
IELTS minimum 6.5 or above (or equivalent) with 6.0 in each individual category
How to apply
Applications should be submitted via the Mathematics PhD Research programme page on the "Apply" tab. Please clearly state the studentship title and supervisor on your application.